P1NM.2 - Electrochemical hydrazine sensor based on atomically-thin sub-nanometer WO3 developed by atomic layer deposition
- Event
- 17th International Meeting on Chemical Sensors - IMCS 2018
2018-07-15 - 2018-07-19
Vienna, Austria - Chapter
- P-1 - Nanomaterials
- Author(s)
- S. Zhuiykov, Z. Wei, Z. Hai, M. Karbalaei Akbari - Ghent University Global Campus, Department of Applied Analytical & Physical Chemistry, Yeonsu-gu, Incheon (South Korea)
- Pages
- 580 - 581
- DOI
- 10.5162/IMCS2018/P1NM.2
- ISBN
- 978-3-9816876-9-9
- Price
- free
Abstract
Wafer-scale two-dimensional (2D) WO3 films with the different thicknesses of 0.78, 1.4, 3.6 and 6.5 nm were fabricated on Au-SiO2/Si substrates by atomic layer deposition (ALD) technique. The surface morphologies and chemical components characterization results showed that WO3 films were aggregated with nanoparticles with the average diameter of 40 nm. The electrochemical behaviors of 2D WO3 films with the different thicknesses towards the hydrazine detection at various conditions and the effect of the thickness on electrochemical performance were investigated using cyclic voltammetry (CV), chronoamperometry and electrochemical impedance spectroscopy (EIS). Significant improvement in hydrazine sensing capabilities was obtained for monolayer WO3 (0.78 nm) with the high sensitivity of 1.24 μA·μM-1·cm-2, linear hydrazine concentration detection ranged from 0.2 μM to 2100 μM, great long-term stability, excellent selectivity and the lowest limit of detection (LOD) of 0.015 μM reported to date. All these facts confirmed that ALD technique can provide a great potential for the nanomaterials fabrication in the development of high performance hydrazine sensor.